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利用磁控溅射方法在单晶硅基片上制备出不同Al含量AlCN非晶薄膜,随后分别在700℃和1000℃进行真空退火热处理.使用X射线衍射仪和高分辨透射电镜研究了沉积态和退火态薄膜的组织和微观结构,用纳米压痕仪测试硬度和弹性模量.结果表明,退火态薄膜组织和微观结构强烈依赖于薄膜的Al含量.经1000℃退火后,低Al含量AlCN薄膜没有出现结晶现象,但形成了分层;高Al含量AlCN薄膜中,退火促使AlN纳米晶的生成,使薄膜形成了非晶包裹纳米晶的复合结构,随着距表面深度的增加,形成的纳米晶密度和尺寸均有减小的趋势.随着退火温度的升高,AlCN薄膜的硬度和弹性模量均降低;而对于高Al含量AlCN薄膜,由于形成了纳米复合结构,硬度和弹性模量下降幅度减少.
AlCN amorphous thin films with different Al contents were prepared on single crystal silicon substrate by magnetron sputtering method and then annealed in vacuum at 700 ℃ and 1000 ℃ respectively.The effects of deposition state and high-resolution transmission electron microscopy The microstructure and microstructure of annealed films were tested by hardness and elastic modulus with nano indenter.The results show that the microstructure and microstructure of annealed films are strongly dependent on the Al content of the films.After annealing at 1000 ℃, No crystallization occurs, but the formation of stratification; high Al content AlCN thin film, annealing prompted the formation of AlN nanocrystals, the film formed amorphous composite nanocrystalline amorphous structure, with the depth from the surface increases, the formation of nano Both the hardness and the elastic modulus of AlCN films decrease with the increase of annealing temperature.For AlCN films with high Al content, the hardness and elastic modulus Decline decreased.