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介绍了ＬＰＣＶＤ法Ｓｉ＿３Ｎ＿４膜与ＰＦＣＶＤ法ＳｉＯ＿２膜的淀积工艺，以及Ｓｉ—Ｓｉ＿３Ｎ＿４—ＳｉＯ＿２钝化工艺在高可靠大电流开关二极管中的应用，并指出了工艺的适用范围。
The deposition process of LPCVD Si_3N_4 film and PFCVD SiO_2 film and the application of Si-Si_3N_4-SiO_2 passivation process in high reliable high current switching diodes are introduced. The applicable range of the process is also pointed out.