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采用真空磁过滤弧沉积的方法 ,制备了高sp3 键含量 ( >90 % )的无氢非晶金刚石薄膜 .研究表明 ,金刚石薄膜具有优异的电子场发射性能 .在电场强度为5V/μm时 ,可产生 5 .4μA的发射电流 .在一定的电场下 ,电流密度可达到几个mA/cm2 .在发射电流为 5 0 μA的情况下 ,薄膜连续工作数天 ,电流的偏差不超过5 % ,表现出电子发射的稳定性 .同时还观察到了大面积的电子发射现象 .由于薄膜微观表面非常平整 ,所以不存在场增强几何因子的作用 ,利用F N理论可计算得到其表面功函数不大于 0 .0 5eV .由于其非晶组织的均匀性 ,使其表面各个部位具有较为一致的功函数 ,因而造成薄膜均匀、稳定的电子发射 .
Ammonia-free amorphous diamond films with high sp3 bond content (> 90%) were prepared by vacuum magnetic filtration arc deposition.The results show that the diamond films have excellent electron field emission properties.When the electric field intensity is 5V / μm, Can produce 5 4 μA emission current under certain electric field, the current density can reach a few mA / cm2 in the case of the emission current of 50 μA, the film for a few days continuous work, the current deviation of not more than 5% Showing the stability of electron emission.At the same time, a large area of electron emission phenomenon was also observed.As the microscopic surface of the film is very smooth, there is no effect of field enhancement geometry factor, and its surface work function can be calculated to be no more than 0 using FN theory. 0 5eV. Due to the uniformity of its amorphous structure, each part of its surface has a more consistent work function, resulting in a uniform and stable electron emission.