纳米级测定材料表面的消失场显微镜

• 出 处: 光机电世界
• 发表日期: 1994年11期
• 关键词: 表面形状 日本大阪大学 探针测定 不锈钢针 金属层 构成元素 光强度 光现象 非破坏性 DNA

日本大阪大学工程部的河田聪教授等人新近开发出以10nm级测定材料表面形状的消失场显微镜。 该显微镜是将试样置于高折射率棱镜上,从其对侧全反射的角度照射激光,便产生称为“消失场”的光,然后采用直径0.1μm的探针测定该“场”。其特点是,采用半导体激光作光源,采用金属不锈钢针作探针,可获得较强的光。

Japan’s Osaka University Engineering Department Professor Kawada et al. Recently developed a 10nm level determination of the material surface shape of the disappearing field microscope. The microscope is to place the sample on a high refractive index prism and irradiate it with laser light at a total reflection angle from the opposite side to produce light called “disappearing field”, which is then measured using a probe having a diameter of 0.1 μm. Its characteristic is that the use of semiconductor laser light source, the use of stainless steel metal needle as a probe, you can get a stronger light.