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采用阴极电弧蒸镀在WC-Co硬质合金基体上沉积Ti_(0.45)Al_(0.55N)、Ti_(0.35)Al_(0.55)Si_(0.1)N和Ti_(0.3)Al_(0.55)Cr_(0.15)N涂层,并在900℃下对涂层试样真空退火30 min和120 min。采用X射线衍射仪和显微维氏硬度计分析比较退火前后涂层的物相及硬度,研究Si、Cr的加入对Ti Al N涂层热稳定性能的影响。结果表明:在Ti Al N涂层中加入Si、Cr后涂层的硬度增加。900℃退火后,Ti_(0.45)Al_(0.55)N涂层的硬度逐渐下降,Ti_(0.35)Al_(0.55)Si_(0.1)N和Ti_(0.3)Al_(0.55)Cr_(0.15)N涂层的硬度则呈上升趋势,并且Ti_(0.3)Al_(0.55)Cr_(0.15)N涂层的硬度始终保持最高,而Ti_(0.45)Al_(0.55)N涂层的硬度最低。Si、Cr的加入能推迟涂层退火过程中软质的密排六方Al N相的形成,Cr还能延缓面心立方(TiAl)N相的调幅分解。Si、Cr的加入有效改善TiAlN涂层的热稳定性能,Ti_(0.3)Al_(0.55)Cr_(0.15)N涂层的热稳定性优于Ti_(0.35)Al_(0.55)Si_(0.1)N。
The Ti_ (0.45) Al_ (0.55N), Ti_ (0.35) Al_ (0.55) Si_ (0.1) N and Ti_ (0.3) Al_ (0.55) Cr_ (0.15) coatings were deposited on the WC-Co cemented carbide substrate by cathodic arc evaporation ) N coating and the coated samples were vacuum annealed at 900 ° C for 30 min and 120 min. The phase and hardness of the coatings before and after annealing were analyzed by X-ray diffraction and micro Vickers hardness tester. The effects of Si and Cr addition on the thermal stability of TiAl N coatings were studied. The results show that the hardness of the coating increases with the addition of Si and Cr to the TiAlN coating. After annealing at 900 ℃, the hardness of Ti 0.45 Al 0.55 N coating decreased gradually, while the hardness of Ti 0.35 Al 0.55 Si 0.1 N and Ti 0.3 Al 0.55 0.15 0.15 The hardness of Ti_ (0.3) Al_ (0.55) Cr_ (0.15) N coating is always the highest while the hardness of Ti_ (0.45) Al_ (0.55) N coating is the lowest. The addition of Si and Cr delayed the formation of a soft hexagonal AlN phase during the annealing process. Cr also delayed the amplitude modulation decomposition of the face-centered cubic (TiAl) N phase. The addition of Si and Cr effectively improves the thermal stability of TiAlN coating. The thermal stability of Ti_ (0.3) Al_ (0.55) Cr_ (0.15) N coating is better than Ti_ (0.35) Al_ (0.55) Si_ (0.1) N.