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应用直流非平衡磁控溅射系统在不同实验条件下制备了ＣＮｘ薄膜材料，其最大氮原子百分含量为３７％。通过傅里叶变换红外光谱、Ｘ光光电子能谱以及显微压痕法的测量和分析，对得到的ＣＮｘ薄膜材料中的原子化学结合状态、硬度等性质进行了表征。
The CNx thin film material was prepared under different experimental conditions using a DC unbalanced magnetron sputtering system. The maximum nitrogen content was 37%. The properties of atomic chemical bonding, hardness and other properties of the obtained CNx thin films were characterized by Fourier transform infrared spectroscopy, X-ray photoelectron spectroscopy and microindentation method.