工艺参数对水体系中电沉积制备Ir层表面形貌的影响(英文)

• 作 者: 钱建刚 肖世明 赵天 栾海静
• 机 构: 北京航空航天大学 仿生智能界面科学与技术教育部重点实验室,
• 出 处: 稀有金属材料与工程
• 发表日期: 2012年07期
• 关键词: 表面形貌 Ir 电沉积 结晶颗粒 电沉积工艺 工艺参数 电流密度 基体 浓度 层形

在水体系中利用直流电沉积的方法以IrCl3为主盐在铂基体上制备出了Ir层。利用SEM、EDS和XPS对不同工艺参数下所制备Ir层的表面形貌及成分进行了分析,并最终获得了最优的电沉积工艺条件。结果表明:IrCl3主盐浓度对Ir层形貌有较大影响,浓度太低时电沉积的铱层太薄,导致铱层易起皮或产生裂纹,故适当提高主盐的浓度有利于改善Ir层质量;在一定的pH值范围内,电沉积所制备的Ir层表面形貌差别不大,表面均比较平整,Ir颗粒比较均匀、致密;电流密度对Ir层表面形貌尤其是对Ir层结晶颗粒的大小和致密性影响较大;电沉积溶液的温度太低时,不能沉积出Ir层,温度太高时,则沉积出的Ir层粗糙、表面形貌不均匀。

In the water system using DC deposition method to IrCl3-based salt on the platinum substrate prepared Ir layer. The surface morphology and composition of Ir layer prepared under different process parameters were analyzed by SEM, EDS and XPS, and finally the optimal electrodeposition process conditions were obtained. The results show that the main salt concentration of IrCl3 has a great influence on the morphology of Ir layer. When the concentration of IrCl3 is too low, the electrodeposited Iridium layer is too thin, resulting in the iridium layer being easy to peel or cracked. In the range of pH value, the surface morphology of Ir layer prepared by electrodeposition is not obvious, the surface is relatively flat and the Ir particles are relatively uniform and dense. The current density has a significant effect on the surface morphology of Ir layer, especially for Ir layer The size and compactness of the crystalline particles are greatly affected. When the temperature of the electrodeposition solution is too low, the Ir layer can not be deposited. When the temperature is too high, the Ir layer deposited is rough and the surface morphology is not uniform.