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一、前言 超纯水在大规模集成电路生产的研磨、抛光、外延、氧化、光刻、扩散等工序中,作为清除器件表面的金属离子沾污和加工过程中的尘埃沾污,保证器件应有的电学性能,提高可靠性等方面都有重要作用。 实验证明,超纯水的水质直接与产品的质量和成品率的提高相关联。对于大规模集成电路的清洗用超纯水,要求有更高的纯度。因为水分子是具有极性的分子,水越纯极性越大,清洗器件表面沾污的能力也就越强。其衡量标准主要有两项,一项是水的电阻率,一项是>0.5μ微粒子的含量。 目前上述标准都是从美国和日本等国家引用过来的。我国尚未制定电子工业用超纯水的
I. INTRODUCTION Ultrapure water, as the metal ion contamination on the surface of devices and the dirt contamination in the process of grinding, polishing, epitaxy, oxidation, photolithography and diffusion in the production of large-scale integrated circuits, ensures that devices Some electrical properties, improve reliability and so has an important role. Experiments show that the water quality of ultrapure water is directly related to the improvement of product quality and yield. For large-scale integrated circuit cleaning with ultra-pure water, require a higher purity. Since water molecules are polar molecules, the more pure water the greater the polarity, the better the ability to clean the surface of the device. There are two main criteria, one is the resistivity of water, one is> 0.5μ particle content. At present, the above standards are quoted from countries such as the United States and Japan. China has not yet formulated ultrapure water for the electronics industry