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随着科学技术的迅速发展,近几十年来,工业、国防以及科学实验对超光滑表面的需求日益增加。所谓超光滑表面是指表面的高度起伏(与平均平面之差)为零点几个nm到几个nm。超光滑表面主要用于薄膜光学研究、X射线光学元件、同步辐射器反射元件、大功率激光器的镜面及窗口和大规模集成电路元件基底等。这些装置的性能都受到原子尺度的表面粗糙度的限制。为此,了解超光滑表面粗糙度是一个非常重要的问题。伴随着这些领域的发展,国外对超光滑表面粗糙度的检测理论的研究和对检测仪器研制进行了许多工作。目前,国外已发展了许多检查超光滑表面的方法,但没有一种方法可以单独的全面评价
With the rapid development of science and technology, there has been an increasing demand for ultra-smooth surfaces in industrial, defense and scientific experiments in recent decades. The so-called ultra-smooth surface refers to the height of the surface undulation (and the average difference between the plane) for a few nm to several nm. Ultra-smooth surfaces are mainly used in thin-film optics, X-ray optics, synchrotron reflective elements, mirrors and windows for high-power lasers, and LSI substrates. The performance of these devices is limited by atomic scale surface roughness. For this reason, understanding the ultra-smooth surface roughness is a very important issue. With the development of these fields, foreign countries have done a lot of work on the detection theory of ultra-smooth surface roughness and the development of testing instruments. At present, many methods of inspecting ultra-smooth surfaces have been developed abroad, but none of them can be evaluated separately