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The bias dependence of radiation-induced narrow-width channel effects (RINCEs) in 65-nm n-type metal-oxidesemiconductor field-effect transistors (NMOSFETs) is investigated.The threshold voltage of the narrow-width 65 nm NMOSFET is negatively shifted by total ionizing dose irradiation,due to the RINCE.The experimental results show that the 65 nm narrow-channel NMOSFET has a larger threshold shift when the gate terminal is kept in the ground,which is contrary to the conclusion obtained in the old generation devices.Depending on the three-dimensional simulation,we conclude that electric field distribution alteration caused by shallow trench isolation scaling is responsible for the anomalous RINCE bias dependence in 65 nm technology.