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溅射法制备高温超导YBa2Cu3O7-δ(YBCO)薄膜材料目前存在的主要问题是沉积速率慢,制备效率低,大面积薄膜均匀性差.本文中,设计了多工位盒型靶直流溅射镀膜系统,提高了YBCO薄膜沉积速率和制备效率,一次工艺流程可沉积六片产品,总薄膜沉积速率最高可到250nm/h.基片自转与公转相结合,提高了薄膜的面内均匀性,同时研究了公转速度与自转速度的关系以及它们对薄膜生长的关系,发现只有在基片公转速度合适的情况下才能生长出性能好的薄膜.LaAlO3(LAO)单晶基片上YBCO薄膜临界电流密度超过2.8MA/cm2(77K,500nm,0T),薄膜微波表面电阻Rs(10GHz,77K)﹤0.2mΩ,1.8英寸内薄膜面内厚度起伏小于3%,双面薄膜一致性好,能够满足微波器件应用的要求.
The main problems existing in the preparation of high temperature superconducting YBa2Cu3O7-δ (YBCO) thin films by sputtering are the slow deposition rate, low preparation efficiency and large area film uniformity.In this paper, a multi-station box-type target DC sputter coating System to improve the YBCO film deposition rate and preparation efficiency, a process can be deposited six products, the total film deposition rate up to 250nm / h substrate rotation and revolution combined to improve the in-plane uniformity of the film, at the same time The relationship between revolution speed and rotation speed and their relationship with the growth of thin films were studied and it was found that the films with good performance can be grown only when the revolution speed of the substrate is suitable.The critical current density of YBCO thin films on LaAlO3 (LAO) 2.8M / cm2 (77K, 500nm, 0T), thin film surface resistance Rs (10GHz, 77K) <0.2mΩ, undulation of less than 3% Request.