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针对环形抛光中抛光盘的面形难以精确控制的问题,以Preston方程和Winkler假定为基础,建立光学元件抛光的基本模型,通过理论分析和计算机模拟与实验,深入研究环形抛光的系统特性。结果表明,系统存在一个保持盘面面形不变的状态,此时的状态为系统的平衡状态,在平衡状态下抛光工件时无需调整校正板位置即可连续获得高精度平面;在不同的工况下,系统平衡状态对应的校正板位置不相同,应用建立的模型定量研究平衡状态下校正板位置与工件尺寸的关系。实验证明在平衡状态下抛光工件时工件的面形精度和加工效率都得到了提高。
Aiming at the problem that it is difficult to precisely control the surface shape of polishing disc in ring polishing, the basic model of optical element polishing is established based on Preston equation and Winkler assumption. The theoretical characteristics of ring polishing are studied through theoretical analysis, computer simulation and experiment. The results show that the system has a state of keeping the shape of the surface of the disk unchanged, and the state at this time is the equilibrium state of the system. When the workpiece is polished in a balanced state, the precision plane can be continuously obtained without adjusting the position of the calibration plate. , The position of the calibration plate corresponding to the system equilibrium state is different. The relationship between the position of the calibration plate and the workpiece size under the equilibrium condition is quantitatively studied by using the established model. Experiments show that the surface shape accuracy and processing efficiency of the workpiece are improved when the workpiece is polished under the balanced condition.