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以SnCl_4-H_2O-N_2作为实验体系,采用流态化CVD技术制备了超细Al_2O_3-SnO_2复合粒子.利用透射电子显微镜(TEM)、X荧光光谱仪(XRF)、高分辨电子显微镜(HREM)等现代测试手段考察了SnO_2在Al_2O_3表面的分散形态及操作参数对SnO_2成膜与成核的影响.讨论了化学气相包覆过程机理.
In this paper, ultrafine Al 2 O 3 -SnO 2 composite particles were prepared by fluidized CVD using SnCl 4 -H 2 O-N 2 as the experimental system.Using the methods of transmission electron microscopy (TEM), X-ray fluorescence (XRF) and high resolution electron microscopy (HREM) The influence of SnO_2 dispersion on the surface of Al_2O_3 and the influence of operating parameters on SnO_2 filming and nucleation were investigated by means of test. The mechanism of chemical vapor deposition was discussed.