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通过低压非稳态扩散流体模型和鞘层碰撞流体模型数值模拟了等离子体源离子注入(PSII)金属圆管内表面改性过程中的多脉冲鞘层动力学行为,研究了等离子体的扩散行为和脉冲特性对离子注入过程的影响。模拟结果显示,工作气压越低等离子体扩散越迅速,0.1 Pa以下还会出现明显的恢复过冲现象。脉冲的占空比较高时,管内壁附近的等离子体来不及恢复到初始状态,从而降低了注入离子流的峰值,但却增大了注入离子流的平均值,平均注入离子流几乎随占空比线性增加。
The multi-pulse sheath dynamics in plasma-assisted ion implantation (PSII) metal tube inner surface modification were modeled by the low-pressure unsteady flow model and the sheath collision fluid model. The diffusion behavior of the plasma and Impulse characteristics of the ion implantation process. The simulation results show that the lower the operating pressure, the faster the plasma diffusion, and the obvious overshooting phenomenon will appear below 0.1 Pa. When the duty cycle of the pulse is high, the plasma near the inner wall of the tube is too late for recovery to the initial state, thereby reducing the peak value of the ion implantation flow but increasing the average value of the ion implantation flow. The average ion implantation flow almost changes with the duty ratio Linear increase.