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介绍用热蒸发结合光刻技术以及离子束刻蚀或热磷酸腐蚀的方法 ,制备用于测量X光成像系统像传递函数的Al静态成像靶的工艺 .对两种腐蚀工艺进行了比较 ,确定离子束刻蚀是获得所需图形的理想方法 .经扫描电镜 (SEM)和台阶仪测量 ,Al静态成像靶的参数满足实验要求 .
This paper introduces the technology of thermal imaging combined with photolithography and ion beam etching or hot phosphoric acid etching to prepare Al static imaging target for measuring the image transfer function of X-ray imaging system.The two etching processes are compared to determine the ions Beam etching is the ideal method to obtain the desired pattern.According to the scanning electron microscope (SEM) and the stepper, the parameters of the Al static imaging target meet the experimental requirements.