论文部分内容阅读
采用脉冲电源在K2SiO3-KOH溶液中对压铸镁合金AZ91D进行微弧氧化,并采用扫描电镜(SEM)及X射线衍射(XRD)研究了微弧氧化电流密度、频率、占空比对陶瓷膜的生长速率、腐蚀速率及组织形貌的影响。结果表明,氧化膜主要由MgO、Mg2SiO4、MgAl2O4和不定形相组成;膜层的生长速率与表面形貌主要由单脉冲的放电能量决定;随电流密度的增加或频率的减小,微弧氧化膜层的生长速率增加,但膜层表面变粗糙并产生裂纹;厚度12～20μm的膜层有较好的耐蚀性。
The die-cast magnesium alloy AZ91D was micro-arc oxidized by K2SiO3-KOH solution using pulsed power. The effects of micro-arc oxidation current density, frequency and duty cycle on the mechanical properties of ceramic film were investigated by scanning electron microscopy (SEM) and X-ray diffraction Growth rate, corrosion rate and morphology of the impact. The results show that the oxide film is mainly composed of MgO, Mg2SiO4, MgAl2O4 and amorphous phase. The growth rate and surface morphology of the film are mainly determined by the single pulse discharge energy. With the increase of current density or frequency, Layer growth rate increases, but the film surface roughness and cracks; 12 ~ 20μm thick film has good corrosion resistance.