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在氢气中,石墨在高温下不是一种化学稳定的物质.本文叙述在开管系统条件下,用气相色谱分析的方法对硅外延系统中氢与石墨的热化学反应产物作了检测.实验结果表明,在1050～1250℃外延温度范围内可明显地观察到甲烷、乙炔、乙稀等碳氢化合物,它们在H_2中浓度有的可达几十ppm~*.在整个外延生长过程中,特别是在生长起始阶段,这些反应产物有可能对H_2带来沾污,并对外延晶体完整性产生一定影响.文中也报道了石墨基座在不同涂层材料如硅、碳化硅等包涂条件下,氢与石墨反应产物相应减少的结果.
In hydrogen, graphite is not a chemically stable material at high temperature.This paper describes the detection of thermochemical reaction products of hydrogen and graphite in silicon epitaxy system by gas chromatographic analysis under open-tube system.Experimental results The results show that hydrocarbons such as methane, acetylene and ethylene can obviously be observed in the range of 1050 ~ 1250 ℃ during epitaxial growth, and their concentration in H 2 can reach tens of ppm ~ *. During the whole epitaxial growth, Is the initial stage of growth, these reaction products are likely to cause contamination of the H_2, and epitaxial crystal integrity have some impact.This paper also reported the graphite base in different coating materials such as silicon, silicon carbide and other coating conditions , The corresponding reduction of hydrogen and graphite reaction products.