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台阶高度是微电子产品的一个重要性能参数.基于双频激光干涉共焦显微系统(DICM)提出了一种微电子掩膜板台阶高度测量的扫描方法,在共焦显微扫描样品表面,当光强达到最大值时,将采样外差干涉的相位作为精确对准的判据.该扫描方法集中融合了外差干涉测量和共焦显微测量的优点,同时实现了高分辨率与较大量程的测量,该系统测量台阶高度的范围取决于Z向位移扫描仪PI Foc的扫描范围,可达数十甚至近百微米.实验结果表明该系统在普通恒温的实验条件下1 h内的漂移不超过5 nm,该系统已经用于20μm高台阶的测量,对准分辨率为0 1 nm,实验结果与台阶高度实际值有很好的一致性.
Step height is an important performance parameter of microelectronics.A scanning method based on dual-frequency laser interferometry confocal microscopy (DICM) is proposed to measure the height of the microelectronic mask. When the intensity of light reaches the surface of confocal microscope, Maximum, the phase of the sampling heterodyne interference is used as the criterion for accurate alignment.The scanning method combines the advantages of heterodyne interferometry and confocal microscopy, while achieving high resolution and large range measurements, The range of height measurement of the system depends on the scanning range of PI Foc of the Z-direction displacement scanner up to tens or even hundreds of micrometers.The experimental results show that the drift of the system does not exceed 5 nm in 1 h under the normal constant temperature conditions, The system has been used for the 20μm high step measurement, the alignment resolution of 0 1 nm, the experimental results and the actual value of the step height are in good agreement.