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通过对快速Ni电刷镀层在不同温度处理后的正电子湮没Doppler展宽能谱线形参数和氢气含量的对比分析,辅之以X射线衍射、电子衍射、扫描电镜、透射电镜和金相等实验,认为快速Ni电刷镀层中含有极高密度的缺陷,且可以分为对氢敏感及对氢不敏感两种类型。由于快速Ni电刷镀层制备工艺的特殊性,正电子湮没参数在该种材料中反映不出氢质子的屏蔽行为。
The experimental data of X-ray diffraction, electron diffraction, scanning electron microscopy, transmission electron microscopy and gold metallography were used to analyze the linear parameters of positron annihilation Doppler broadening spectrum and the hydrogen content of the rapid Ni brush coating at different temperatures , That rapid Ni brush plating contains very high density defects, and can be divided into hydrogen-sensitive and hydrogen-insensitive two types. Due to the particularity of the preparation process of the rapid Ni brush plating, the positron annihilation parameters do not reflect the shielding behavior of hydrogen protons in this material.