The surface morphologies of (Pb,Sr)TiO_3 thin film fabricated on Si-buffered Pt/Ti/SiO_2/Si substrat

• 作 者: 李弢 古宏伟
• 机 构: Superconducting Materials Research Center in General Research Institutefor Non-ferrous Metals Beij
• 出 处: 广东有色金属学报
• 发表日期: 2005年Z1期
• 关键词: buffered sputtering magnetron diffractometer preferred sizes microwave attribute

(Pb,Sr)TiO_3 (PST) thin film are fabricated by RF magnetron sputtering on Si-buffered Pt/Ti/SiO_2/Si substrates with different buffer layer deposition time. Surface morphologies of the buffer layer indicate an improving surface roughness and larger grains with the prolongation of sputtering time. Deposition of PST thin films shows excellent surface fluctuation filling ability to improve the surface roughness of substrates. PST surface morphologies exhibit apparently different grain forms according to the preparation time durance of buffer layer.

(Pb, Sr) TiO 3 (PST) thin films are fabricated by RF magnetron sputtering on Si-buffered Pt / Ti / SiO 2 / Si substrates with different buffer layer deposition time. Surface morphologies of the buffer layer indicate an improving surface roughness and greater grains with the prolongation of sputtering time. Deposition of PST thin films shows excellent surface fluctuation filling ability to improve the surface roughness of substrates. PST surface morphologies exhibit apparently different grain forms according to the preparation time durance of buffer layer.