论文部分内容阅读
,Reduction of the phosphorus contamination for plasma deposition of p-i-n microcrystalline silicon s
【作 者】
:
【机 构】
:
Institute of Photo-electronlc Thin Film Devices and Technology of Nankai University,Key Laboratory o
【出 处】
:
中国物理B(英文版)
【发表日期】
:
2010年9期
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