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陶瓷材料如氧化铝、铁氧体、石英、钛酸钡等均可以在室温下金属化,并具有高的封接强度和真空密封,这种方法称之为离子涂敷。然后金属化的部件就可以用一般真空管钎焊合金如银-铜共晶焊料钎焊在一起,并能承受500～600℃的热循环实验。直流辉光放电用于离子涂敷,要金属化的基片作为负极,金属化材料作为正极。用氩气在两个电极之间产生放电。基片首先用离子轰击进行清洗,然后不使放电熄灭就用电阻加热金属化材料使其蒸发成为等离子体。有些金属原子在电场的作用下电离、加速并沉积到基片上。沉积速率和通过能力同电镀接近。除上述离子涂敷之外,目前研制中的一种新工艺是把离子涂敷和化学蒸发相结合,下面将要详细叙述。
Ceramic materials such as alumina, ferrite, quartz, barium titanate and the like can be metalized at room temperature with high seal strength and vacuum tightness, a process known as ion coating. The metalized parts can then be brazed together using a generally vacuum tube brazing alloy, such as silver-copper eutectic solder, and can withstand thermal cycling from 500 to 600 ° C. DC glow discharge is used for ion plating, the substrate to be metallized serves as the negative electrode, and the metallized material serves as the positive electrode. Argon was used to create a discharge between the two electrodes. The substrate is first cleaned with ion bombardment and then heated to resistively heat the metallized material to vaporize it into a plasma without quenching the discharge. Some metal atoms ionize under the action of an electric field, accelerate and deposit on the substrate. Deposition rate and throughput are close to plating. In addition to the above-mentioned ion coating, a new process currently in development is the combination of ion coating and chemical vaporization, as described in more detail below.