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一、引言 离子注入技术是近年来发展起来的一种新技术,在六十年代开始在半导体器件生产中应用。到目前为止离子注入技术已迅速地扩大应用到固体物理和材料科学等许多领域。但是目前利用此技术对非晶合金材料的研究工作还不是很多。
I. INTRODUCTION Ion implantation technology is a new technology developed in recent years. It began to be used in the production of semiconductor devices in the 1960s. To date, ion implantation has rapidly expanded to include many areas of solid state physics and materials science. However, the use of this technology for amorphous alloy material research work is not yet very much.