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用透射电镜和扫描电镜观察了铝阳极氧化膜中孔洞形成与发展的过程，讨论了孔洞产生的原因。结果表明，在本实验条件下，当阳极电流密度增加到ZA／dm2时，膜层中开始出现明显的孔洞，其孔洞尺寸约71～144mn；当达到7．5A／dm2时，孔洞尺寸将增加到150～300nm。保持1A／dm2以下的较低电流密度可获得无明显孔洞的氧化膜。而氧化时间的延长，会使膜层中已存在的孔洞尺寸进一步增加，而孔洞数量明显下降。
The formation and development of the pores in the anodized aluminum film were observed by transmission electron microscopy and scanning electron microscopy, and the reasons for the occurrence of cavities were discussed. The results show that when the anode current density is increased to ZA / dm2, obvious pores begin to appear in the film, and the pore size is about 71 ~ 144mn. When the anode current density reaches 7.5A / dm2, the pore size will increase To 150 ~ 300nm. Maintaining lower current densities below 1 A / dm2 results in an oxide film with no apparent porosity. The oxidation time extension, will make the film has been further increased in the size of the hole, while the number of holes decreased significantly.