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为了制备满足设计要求的宽角度、宽波段减反膜,利用离子束溅射沉积技术,在时间-功率控厚的模式下,对膜层沉积速率进行了精确修正。在实验中,利用时间-功率控厚的离子束溅射沉积技术,选择HfO2和SiO2作为高低折射率组合,在超抛ZF6玻璃基底上制备了宽角度、宽带减反膜,通过对实验后的透过率光谱曲线的数值反演计算,获得膜层厚度修正系数,初步得到了沉积速率随沉积时间变化的规律。利用修正后的沉积参数制备设计的膜系,在0°~30°入射角度下,600~1 200 nm波段的平均透过率达到99%以上。
In order to prepare the wide-angle and wideband anti-reflection film that meets the design requirements, the deposition rate of the film was precisely corrected by ion-beam sputter deposition in time-power controlled thickness mode. In the experiment, a wide angle and wideband anti-reflection film was prepared on the ultrafine ZF6 glass substrate by using time-power controlled thickness ion beam sputtering deposition technology and HfO2 and SiO2 as the high and low refractive index combinations. Through the numerical inversion of the spectral curve of transmittance, the film thickness correction coefficient was obtained, and the rule that the deposition rate changed with the deposition time was obtained. The modified coating parameters were used to prepare the designed membrane system. The average transmittance of 600 ~ 1 200 nm band was more than 99% at the incident angle of 0 ° ~ 30 °.