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为了提升Al/Zr多层膜的热稳定性，采用直流磁控溅射方法制备了18个带有不同厚度Si间隔层的Al(1 wt.%Si)/Zr多层膜，并将这些样品分别进行了不同温度(100~500℃）的真空退火，退火时间为1 h。利用X射线掠入射反射(GIXR)和X射线衍射(XRD)的方法来研究Si间隔层对Al/Zr多层膜热稳定性的作用。GIXR测量结果表明：随着Si间隔层厚度的增大，Al膜层的粗糙度减小，而Zr膜层的粗糙度增大；XRD测量结果表明：Al和Zr膜层粗糙度的变化是由于退火后膜层中晶粒尺寸不同造成的。相比于没有Si间隔层的Al/Zr多层膜，引入厚度为0.6 nm的Si间隔层可以有效提升Al/Zr多层膜的热稳定性。“,”To improve the thermal stability of Al/Zr multilayers, eighteen Al (1 wt.%Si)/Zr multilayers with different thickness (0.4 nm, 0.6 nm and 0.8 nm) of Si barrier layers were prepared by using the direct-current magnetron sputtering system. All the multilayers were annealed from 100℃ to 500℃ in a vacuum furnace for 1 h. To evaluate the effect of Si barrier layers on the thermal stability of Al/Zr system, the multilayers were characterized by grazing incidence X-ray reflectance (GIXR) and X-ray diffraction (XRD). From the alloy-interlayer model in the GIXR, the roughness of Al layer decreases with increasing thickness of Si barrier layers, while the roughness of Zr layer increases. Based on the XRD, the changing trends of crystal sizes of Al and Zr can explain the results in the GIXR. Comparing with the multilayers without Si barrier layers in the annealing process, the sample with Si barrier layer (0.6 nm) have better structural performance, of which the multilayers could have a stable structural performance above 300℃.