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研究了铬膜和铌膜的复合对锆合金基体上制备的直流磁控溅射薄膜附着性的影响。使用扫描电镜(SEM)观察了膜层界面,用原子力显微镜(AFM)观察了膜层表面,用划痕法测定了薄膜的附着性。结果表明:膜/基界面结合良好,界面成分升降区狭窄;铬膜与铌膜组成的复合薄膜结合紧密;铬膜的组织为致密、边界孔洞少的纤维状晶粒,铬膜厚度为2 靘时,晶粒仍为亚微米级,但晶粒顶面已出现拱形;膜厚同为2 靘时,外层1 靘铌膜+内层1 靘铬膜组成的复合膜的附着性分别是外层1 靘铬膜+内层1 靘铌膜组成的复合膜的2.35倍、2 靘铬膜附着性的3倍,其原因在于膜层组织及力学性能变化、铌膜韧性好和复合顺序。因此,依靠铬膜厚度的增加来提高铬膜保护性的方法具有较大局限性,通过在一定厚度的铬膜外复合铌膜的方法则有较好的可行性。
The effect of the combination of chromium film and niobium film on the adhesion of DC magnetron sputtering films prepared on zirconium alloy substrate was studied. The interface of the film was observed by scanning electron microscope (SEM). The surface of the film was observed by atomic force microscope (AFM). The adhesion of the film was measured by scratch method. The results show that the film / base interface is well bonded and the interface composition is ascending and slipping as narrow as possible. The composite film composed of chrome film and niobium film is tightly bonded. The chrome film has dense and fibrous border with few holes and the thickness of chrome film is 2 靘, The grain is still sub-micron, but the top of the grain has arched; when the film thickness is 2 靘, the adhesion of the composite film composed of 1 靘 niobium film and 1 靘 chrome film is The outer layer of 1 靘 chrome film + the inner layer 1 靘 niobium composite film 2.35 times, 2 靘 chrome film adhesion 3 times, which is due to the changes in film organization and mechanical properties, niobium film toughness and composite sequence. Therefore, relying on the increase of chromium film thickness to improve the protection of chromium film has more limitations, by a certain thickness of chromium film composite film is better than the feasibility of niobium.