Editorial Introduction:China's IC industry has been flourishing in recent years,huge market demand together with government investments are the major drivin
The Atomic Layer Deposition process(ALD)is widely used in FinFET,3D-NAND and other important technologies because of its self-limiting signature and low growth
On the basis of thermodynamic and kinetic consideration of Ge-O system,high-pressure oxidation(HPO)on Ge was proposed to suppress the GeO desorption during the