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随着半导体中、大规模集成电路的飞速发展,光刻掩模的制备手段和使用材料都发生了巨大变革,乳胶掩模版几乎已全为金属掩模、表面敷有防止反射膜的掩模以及橙色透明金属氧化物的掩模所取代。但是在初缩、精缩的过程中母版的制作及在通常的光学照相系统中,暂时还找不到更理想的替代物。所以,如何提高乳胶干版的质量,找出最佳的使用工艺成为从事制版工作的人们不断探讨的课题。本文仅对乳胶掩模版的制备工艺提出一些方法和意见。
With the rapid development of large-scale integrated circuits in semiconductors, great changes have taken place in the preparation of lithographic masks and in the materials used. Latex masks are almost entirely metal masks with a mask that prevents the reflective film on the surface and Orange transparent metal oxide mask replaced. However, during the initial shrinking and shrinking process, the production of the master and in the usual optical photographing system still could not find a better substitute for the moment. Therefore, how to improve the quality of latex dry plate, to find out the best use of technology to become engaged in the work of the plate people continue to explore the issue. This article only on the preparation of latex reticle made a number of methods and opinions.