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采用流体力学模拟方法,建立了垂直非淹没射流的计算流体动力学模型,研究了在紫外光诱导纳米颗粒胶体射流中用直径D为500μm的微孔光-液耦合喷嘴进行抛光加工的冲击动力学,分析了非淹没射流条件下光-液耦合喷嘴内、外的流场分布情况及其对工件表面的喷射冲击特征,对紫外光诱导纳米颗粒胶体射流冲击动力学过程进行了理论描述。计算结果表明,在1MPa入射压力时,微孔光-液耦合喷嘴口TiO2胶体的喷射速度约为30m/s,其集束匀速喷射距离约为5mm。在此喷射距离时进行垂直喷射,在胶束与工件表面的冲击射流作用区域,其射流静压最大值分布在射流冲击作用中心,但射流动压及射流合成速度在此区域的截面分布呈“W”形状,射流动压及速度最大值出现在胶体射流束的外环直径约2mm处。
The CFD model of vertical non-submerged jet was established by using the method of hydrodynamics simulation. The impact kinetics of the polishing process by using micro-hole optical-liquid coupling nozzle with diameter D of 500 μm in UV-induced colloidal jets was studied The distribution of flow field inside and outside the light-liquid coupling nozzle under non-submerged jet and its jet impact on the surface of the workpiece were analyzed. The kinetics of the impinging kinetics of the colloidal UV-induced nanoparticle jet was described theoretically. The calculated results show that the jet velocity of TiO2 colloids is about 30m / s at a pressure of 1MPa and the uniform beam jet speed is about 5mm. In this jetting distance, the vertical jet was applied. The maximum jet hydrostatic pressure was distributed in the jet impact center in the region of the impact jet of the micelles and the workpiece surface. However, the cross-sectional distribution of jet dynamic jet and jet jet velocity in this region was The “W” shape, jet hydrodynamic pressure, and maximum velocity occur at about 2 mm diameter of the outer ring of the colloidal jet.