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CVD TiN 涂层硬度随沉积温度和气体总流量的增加而增加。沉积温度高于1323K,Cr12M_0V 基体表面生成的是 Ti(C,N)复合涂层。其硬度和粘附性能均高于 TiN 涂层,最高维氏硬度达到3363kg/mm~2。Gr12MoV 基体,沉积金黄色、粘附性能好,维氏硬度高达2000—2500kg/mm~2。TiN 涂层最佳沉积条件是:TiCl_4蒸发温度313K,1:2N—H 摩尔比,1323K 沉积温度和2400Cm~3/min 气体总流量。(220)方向择优成长,随气体线速度增加或沉积温度升高而增加。
CVD TiN coating hardness increases with increasing deposition temperature and total gas flow. The deposition temperature is higher than 1323K, Ti (C, N) composite coating is formed on the surface of Cr12M_0V substrate. Its hardness and adhesion are higher than the TiN coating, the highest Vickers hardness of 3363kg / mm ~ 2. Gr12MoV matrix, gold deposition, good adhesion, Vickers hardness of up to 2000-2500kg / mm ~ 2. TiN coating the best deposition conditions are: TiCl_4 evaporation temperature 313K, 1: 2N-H molar ratio, 1323K deposition temperature and 2400Cm ~ 3 / min total gas flow. (220) preferred growth, with the gas line speed increases or deposition temperature increases.