论文部分内容阅读
准分子激光器正在扎实地从实验室仪器发展成生产工具。美国Leitz-Image微系统公司近来推出一种定位标记激光光致烧蚀系统(ALPHA),专为自动去除覆盖硅晶片上定位标记的光致抗蚀剂材料而设计。最先进的光刻系统使用这些标记在曝光之前获得
Excimer lasers are solidly developed from laboratory instruments into production tools. Leitz-Image Microsystems, Inc. recently introduced a positioning mark laser photo ablation system (ALPHA) designed to automatically remove photoresist marks that overlay alignment marks on silicon wafers. The most advanced lithography systems use these markings prior to exposure