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用射频溅射法在粗糙基底上制备了ＺｒＯ２ 膜，模拟了在该种条件下膜的表面形貌、空腔的形成规律，提出了在粗糙基底上镀制性能均匀、稳定薄膜的对策．
The ZrO2 film was prepared on the rough substrate by radio frequency sputtering. The surface morphology and cavity formation of the film were simulated under this kind of conditions. The countermeasures of coating the coarse substrate with uniform property and stable film were proposed.