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离子注入处理通常被用作掺杂半导体元件,借以提供选择性改变材料表面性能的潜力。通过入射离子束产生的成份结构变化及邻近表面层形态的变化导致了处理表面的性能变化。已经证明如硬度、磨擦系数、耐磨损、耐腐蚀、表面能以及其它的表面性能可以在不对整体性能产生不利影响的同时由离子注入予以改变。本文叙述了离子注入的独特功能、显著的特征和技术的综合潜力。基于Spire公司的经验,介绍了离子注入处理的成功应用并且概述了选择有希望的应用对象的标准。在主要(?)要高的可靠性和再现性的应用市场中,表征离子注入处理特点的内在质量控制已占据适当的位置。预期这种技术在有选择地应用到航天直至生物材料方面将作出不断的贡献。
Ion implantation processes are commonly used as doped semiconductor devices to provide the potential to selectively alter the surface properties of a material. Changes in the composition of the structure caused by the incident ion beam and changes in the morphology of the adjacent surface layers result in changes in the properties of the treated surface. It has been demonstrated that changes in hardness, coefficient of friction, wear resistance, corrosion resistance, surface energy, and other surface properties can be altered by ion implantation without adversely affecting overall performance. This article describes the unique features of ion implantation, the salient features and potential of the technology. Based on Spire’s experience, the successful application of ion implantation is introduced and a selection of promising application targets is outlined. In applications requiring high levels of reliability and reproducibility, intrinsic quality control characterizing the ion implantation process has taken its place. It is expected that this technology will make an ongoing contribution in the selective application of aerospace to biological materials.