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从主体树脂性质、光引发剂的选择、助剂的选择、溶剂的设计等多个方面论述了含氟纳米压印光刻胶的研制工艺。在纯有机材料为主体的光刻胶中引入了全氟丙烯酸酯助剂,解释了含氟助剂在光刻胶中的作用。使用接触角法评估了全氟丙烯酸酯对光刻胶表面性质的影响,并通过接触角数据预测了光刻胶的脱模能力。通过旋涂、压印、刻蚀等实验验证了光刻胶的性能,并通过实验数据筛选出了最佳配方。研制出的光刻胶样品图形保真度高、分辨率好,对底材有良好的黏附力,且具有良好的脱模能力。
The development of fluorine-containing nanoimprint photoresist is discussed from the aspects of the main resin, the selection of photoinitiator, the selection of additives and the design of solvent. The introduction of perfluoroacrylate aids into photoresists based on purely organic materials explains the role of fluorine-containing aids in photoresists. The contact angle method was used to evaluate the effect of perfluoroacrylate on the surface properties of the photoresist. The contact angle data were used to predict the photoresist releasability. The performance of photoresist was verified by spin-coating, embossing and etching experiments, and the best formula was screened out through experimental data. Developed the photoresist sample pattern fidelity, resolution, good adhesion to the substrate, and has a good mold release ability.