【摘 要】
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A new design of shallow-etched multilayer dielectric grating (MDG) exhibiting a diffraction efficiency (DE) of approximately 100% in the –1st order at 1064-nm wavelength in Littrow mounting is reported. Particle swarm optimization algorithm and Fourier mo
【机 构】
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KeyLaboratoryofMaterialScienceandTechnologyforHighPowerLasers,ShanghaiInstituteofOpticsandFineMechan
【出 处】
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ChineseOpticsLetters
论文部分内容阅读
A new design of shallow-etched multilayer dielectric grating (MDG) exhibiting a diffraction efficiency (DE) of approximately 100% in the –1st order at 1064-nm wavelength in Littrow mounting is reported. Particle swarm optimization algorithm and Fourier modal method are used to design MDG and calculate the DE of MDG. The thickness of the grating layer is less than 80 nm which is much shallower than that in the currently reported MDG design for a high DE, which is greatly helpful for the MDG etching process. Meanwhile, the bandwidth of DE which is more than 97.5% of MDG is 60 nm, and it is a meaningful result for MDG to be used in ultrashort pulse compression system.
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