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已经广泛应用于制造半导体器件的离子注入方法,现已发展成为一种很精巧的金属表面处理工艺,使材料表面具有耐磨损和抗腐蚀的能力。尽管离子的注入深度是很浅的,但确实存在这样一种机理,可以改进材料的持久性能。已经设计了一种可以减少加工费用的设备,使得离子注入工艺可以和通常的金属精加工工艺相竞争。采用离子注入方法,可使钢和碳化钨等材料的使用寿命提高3～5倍。本文将重点介绍生产中已经应用的工模具和组合件离子注入工艺。
Ion implantation methods that have been widely used in the fabrication of semiconductor devices have evolved into a sophisticated metal surface treatment process that gives the material a wear-resistant and corrosion-resistant surface. Although ion implantation depth is very shallow, but there is a mechanism that can improve the durability of the material. A device that reduces processing costs has been designed so that the ion implantation process can compete with the usual metal finishing processes. The use of ion implantation method can make the life of steel and tungsten carbide and other materials increased by 3 to 5 times. This article will highlight the tooling and assembly ion implantation processes already used in production.