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本文为研究γ-MPS/SiO_2界面层厚度与形态,使用自编程序,通过计算机数值模拟和图形分析后确定:当SiO_2膜厚为1250～1450A,激光源入射角为65～75°的最佳椭偏仪测定条件时,灵敏度可提高至1A,从而能在国产椭偏仪上对10A左右的界面超薄层膜具有足够的测试灵敏度。实验中应用的SiO_2/Si平片是一种新的适宜于作界面研究的玻纤模型。由此模型凭借椭偏仪和扫描电镜,可获得经γ-MPS水溶液处理再经溶剂淋洗后形成的γ-MPS/SiO_2界面层的重要信息:界面层结构是1～2个单分子层;形态为连续的膜层,偶尔可见被淋洗去的γ-MPS水解介聚物残留的边缘隆起的椭圆形凹坑。
In order to study the thickness and morphology of γ-MPS / SiO_2 interfacial layer, self-programmed program was used to determine the optimum thickness of γ-MPS / SiO_2 interfacial layer. When the thickness of SiO_2 film was 1250-1450 A and the incident angle of laser source was 65-75 °, Ellipsometer measurement conditions, the sensitivity can be increased to 1A, which can be made on the domestic ellipsometer ultra-thin film on the interface 10A has enough test sensitivity. The SiO_2 / Si plate used in the experiment is a new glass fiber model suitable for the study of interface. From this model, the important information of the γ-MPS / SiO 2 interfacial layer formed by the γ-MPS aqueous solution rinsing after solvent leaching is obtained by ellipsometry and scanning electron microscopy: the interfacial layer structure is 1 or 2 monolayers; The morphology of the continuous film, and occasionally visible to be rinsed away γ-MPS hydrolysis of the edge of the residual polymer raised oval-shaped pit.