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利用直流磁控溅射技术在玻璃衬底上沉积了TiO2薄膜,并对其进行了Co离子注入,最后在真空中500℃退火50min,得到系列薄膜样品.利用剥离-分散方法制备了薄膜的透射电镜样品,并用扫描电镜(SEM)、X射线能量散射谱(EDX)和高分辨透射电镜(HRTEM)对样品做了近似原位观察,研究了薄膜样品中不同Co离子注入深度的成分分布和显微结构.结果表明,薄膜呈锐钛矿结构,Co元素主要分布在薄膜表层,Co离子的注入使TiO2薄膜的晶粒被部分破坏,并形成CoO,而500℃退火处理可以修复被破坏的晶粒,促进薄膜更好地结晶并且使CoO融和到TiO2晶格中.振动样品磁强计(VSM)测试结果表明,Co离子注入TiO2薄膜在室温下表现铁磁性,真空中的退火处理可以使其铁磁性增强,铁磁性可以用结合磁极子(bound magnetic polaron,BMP)理论来解释.
TiO2 film was deposited on a glass substrate by direct current magnetron sputtering and Co ion implantation was performed on the glass substrate, and finally annealed at 500 ℃ in vacuum for 50min to obtain a series of film samples. The film transmission was prepared by a lift-off method The samples were observed by in situ observation with scanning electron microscopy (SEM), energy dispersive X - ray spectroscopy (EDX) and high resolution transmission electron microscopy (HRTEM). The distribution and distribution of different Co ions in the film samples The results show that the film is anatase and the Co element is mainly distributed on the surface of the film. The implantation of Co ions partially destroys the crystal grains of the TiO2 film and forms CoO, while the annealed at 500 ℃ can repair the damaged crystal Particles to promote better crystallization of the film and to melt the CoO into the crystal lattice of the TiO2.Vibrational sample magnetometer (VSM) test results show that the Co ion-implanted TiO2 film exhibits ferromagnetism at room temperature and the annealing in vacuum can make it Ferromagnetism is enhanced and ferromagnetism can be explained by the bound magnetic polaron (BMP) theory.