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光子筛作为一种新兴的纳米成像器件,具有分辨力高、体积小、重量轻、易复制等优点,被广泛地应用到纳米光刻、大型天文望远镜、航空航天摄像等领域。为了追求高分辨力,须将光子筛的小孔直径做得非常小,但当光子筛的小孔直径远小于入射光波波长时,标量衍射理论已不再成立,必须采用矢量衍射理论来进行光子筛的设计。利用矢量衍射理论建立了光子筛的衍射模型,并基于此模型进行了光子筛结构的设计与优化。为了考察模型的有效性,进行了数值模拟。数值模拟结果表明,基于矢量衍射模型设计的光子筛的聚焦性能良好;在近场区,标量衍射模型不再适用,而矢量衍射模型却能较好地满足设计要求。
As a new nanometer imaging device, photon sieve has the advantages of high resolution, small volume, light weight and easy to be copied. It is widely used in the field of nano-lithography, large-scale astronomical telescope and aerospace camera. In order to pursue high resolution, the diameter of the aperture of the photon sieve must be made very small. However, when the diameter of the aperture of the photon sieve is much smaller than the wavelength of the incident light, the theory of scalar diffraction is no longer valid. Vector diffraction theory must be used for photons Screen design. The diffraction model of photonic sieve was established by using vector diffraction theory. Based on this model, the photonic sieve structure was designed and optimized. In order to examine the validity of the model, numerical simulations were carried out. The numerical simulation results show that the focusing performance of the photon sieve based on the vector diffraction model is good. In the near field, the scalar diffraction model is no longer applicable, but the vector diffraction model can meet the design requirements well.