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采用射频磁控溅射和退火处理的方法在单晶硅衬底上制备了ZnO/SiO2复合薄膜,利用X射线衍射(XRD)、扫描电镜(SEM)、能谱分析(EDS)和接触角测量等测试手段研究溅射气压、溅射功率、氧氩比和退火温度等对复合薄膜成分组成、组织结构及润湿性能的影响。研究表明,复合薄膜中主要有ZnO、SiO2、Zn2SiO4 3种物相,且分别以六方纤锌矿结构、无定形态和硅锌矿型等形式存在。随着溅射和退火工艺的改变,复合薄膜的接触角在41°～146°间变化,组织形态由颗粒状向纳米竹叶状变化。溅射气压0.5 Pa,溅射功率120 W,氧氩比(O2∶Ar)为0∶30,退火温度为700℃的条件下获得具有六方纤锌矿结构的ZnO纳米组织,该组织呈现出竹叶状,在薄膜表面交错排列形成了无序多空隙的微观形貌,使复合薄膜具有超疏水性,接触角为146°。
ZnO / SiO2 composite films were prepared on single crystal silicon substrates by RF magnetron sputtering and annealing. The films were characterized by X-ray diffraction (XRD), scanning electron microscopy (SEM), energy dispersive spectroscopy (EDS) and contact angle The effects of sputtering pressure, sputtering power, oxygen-argon ratio and annealing temperature on the composition, microstructure and wettability of the composite films were studied. The results show that there are mainly three phases of ZnO, SiO2 and Zn2SiO4 in the composite film, which are hexagonal wurtzite, amorphous and wurtzite. With the change of sputtering and annealing process, the contact angle of the composite films varied from 41 ° to 146 °, and the morphology changed from granular to nano-bamboo. A sputtering pressure of 0.5 Pa, a sputtering power of 120 W, an oxygen-argon ratio (O2: Ar) of 0:30 and an annealing temperature of 700 ° C., a ZnO nanostructure with a hexagonal wurtzite structure is obtained, Leaf-like, staggered in the film surface formed a disorderly multi-voids of the micro-morphology, the composite film has superhydrophobic, contact angle of 146 °.