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本文简述了AZ1350正性光致抗触剂电子束制版工艺技术的研究和开发,给出了该技术的几个重要工序工艺条件的选择和确定,认为AZ1350正性光致抗蚀剂用于电子束制版是切实可行的。
In this paper, the research and development of AZ1350 positive photo-resist agent electron beam platemaking technology are briefly introduced. The selection and determination of process conditions for several important processes of the technology are given. AZ1350 positive photoresist is used in Electron beam plate making is feasible.