论文部分内容阅读
采用室温磁控溅射技术在纳米晶体钛(剧烈塑性变形制备)表面制备出碳化硅(SiC)薄膜,研究SiC薄膜的组织结构、纳米压痕行为和摩擦磨损性能。结果表明:SiC薄膜具有纳米尺度“畴”特征的表面形貌、高含量Si-C键、与基材间具有明显且呈梯度的元素扩散、低的纳米硬度(10.62GPa)、低的弹性模量(83.34GPa)和高的硬模比(0.128)。在1.96N载荷、氮化硅球(半径为2mm)为对摩件、室温空气条件下,其磨损速率为10-5mm3.m-1.N-1级、摩擦系数约为0.162,磨损后薄膜不出现裂纹和剥落。
Silicon carbide (SiC) films were prepared by magnetron sputtering at room temperature on the surface of nanocrystalline Ti (prepared by severe plastic deformation). The microstructure, nanoindentation and friction and wear properties of SiC films were investigated. The results show that SiC thin films have surface morphology with nano-scale “domain ” features. High content of Si-C bond has obvious and gradient diffusion between matrix and substrate, low nanohardness (10.62GPa), low Elastic modulus (83.34GPa) and high modulus (0.128). In the 1.96N load, silicon nitride balls (radius 2mm) for the friction member, room temperature air conditions, the wear rate of 10-5mm3.m-1.N-1 level, the friction coefficient of about 0.162, after the wear film No cracks and flaking.