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高熵合金氮化物薄膜性能优异,目前国内对Al0.3Cr Fe1.5Mn Ni0.5高熵合金的研究主要是对块体,对薄膜研究较少。采用直流磁控溅射技术在硅片上沉积了Al0.3Cr Fe1.5Mn Ni0.5高熵合金氮化物薄膜。利用X射线衍射仪(XRD)、扫描电子显微镜(SEM)、纳米压痕仪等分析了基板偏压对薄膜的晶体结构、溅射效率、硬度和摩擦磨损性能的影响。结果表明:基板偏压为-50 V时,薄膜的晶体结构为面心立方结构(FCC),薄膜截面有明显的柱状结构;随着偏压幅值的增加,衍射峰的强度降低,晶粒尺寸减小,薄膜的溅射效率降低,硬度提高;基板偏压为-150 V时薄膜硬度最高,为13.74 GPa,此时薄膜的抗摩擦磨损性能最好。
High-entropy alloy nitride film has excellent performance. At present, the research on Al0.3CrFe1.5Mn Ni0.5 high-entropy alloy is mainly on the bulk and less on the film. Al0.3CrFe1.5Mn Ni0.5 high-entropy alloy nitride film was deposited on silicon by DC magnetron sputtering. The effects of substrate bias on the crystal structure, sputtering efficiency, hardness and friction and wear properties of the films were analyzed by X-ray diffraction (XRD), scanning electron microscopy (SEM) and nanoindentation. The results show that the crystal structure of the film is FCC with a substrate bias of -50 V, and the columnar structure has a clear columnar structure. The intensity of the diffraction peak decreases with the increase of the bias voltage. The size of the film decreases, the sputtering efficiency of the film decreases and the hardness increases. The highest film hardness of the film is -1.74 GPa at substrate bias of 13.74 GPa, and the antifriction and wear properties of the film are the best.