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使用透射电子显微镜,对光化学气相淀积法淀积的氢化非晶硅薄膜的微晶结构进行了研究.非晶硅薄膜上表面的圆形结构对应于圆柱形晶体结构和非晶-微晶混合结构.并证明:通过光化学气相淀积工艺仅在150℃就能获得0.3μm大的单晶粒.
The microcrystalline structure of hydrogenated amorphous silicon thin films deposited by photochemical vapor deposition was investigated by transmission electron microscopy.The circular structure of the upper surface of the amorphous silicon thin film corresponds to the combination of the cylindrical crystal structure and the amorphous-microcrystalline mixture Structure and proved that only 0.3μm large single crystal grains can be obtained by photochemical vapor deposition process at 150 ℃.