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在许多应用中显然需要薄的干润滑膜,而溅射是理想的适合于提供这样的涂层的工艺过程。由于在这个过程中用了高能量,难免发生一些化学计量损耗和结构偏差。据观察,精确控制过程参数可以大大地减少化学计量的偏差,与MoS_2同时共溅其它材料显然有助于膜的结构生长。鉴于这些观察结果,这个报告比较了常规溅射MoS_2涂层和MoS_2+Ni共溅涂层,比较是在滑动磨损条件下用不同试验速度、负荷和涂层厚度进行的。
In many applications it is clear that a thin, dry lubricant film is needed, and sputtering is the ideal process for providing such a coating. Due to the high energy used in this process, some stoichiometric losses and structural deviations are inevitable. It has been observed that precise control of the process parameters can greatly reduce the stoichiometry bias and co-sputtering of other materials with MoS2 apparently contributes to the structural growth of the film. In view of these observations, this report compares conventional sputtered MoS 2 and MoS 2 + Ni co-sputtered coatings, compared with different test speeds, loads and coating thicknesses under sliding wear conditions.