Fabrication of micro carbon pillar by laser-induced chemical vapor deposition

• 作 者: 周健 罗迎社 李立君 钟琦文 李新华 殷水平
• 机 构: CollegeofMachineryandElectrical,InstituteofRheologicalMechanicsandMaterialEngineering,DepartmentofTe
• 出 处: Journal of Central South University of Technology
• 发表日期: 2008年S1期
• 关键词: LASER-INDUCED chemical vapor deposition(LCVD) GROWING rapid DIAMETER microcarbon

Argon ion laser was used as the induced light source and ethane(C2H4) was selected as the precursor gas,in the variety ranges of laser power from 0.5 W to 4.5 W and the pressure of the precursor gas from 225×133.3 Pa to 680×133.3 Pa,the experime