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离子镀膜技术以其特有的优点正越来越引起国内外的重视,近几年发展迅速。离子镀把辉光放电、等离子体技术与真空蒸镀技术结合在一起,提高了镀层的各种性能、扩大了镀膜技术的应用范围。它兼有真空蒸镀和真空溅射的优点,还具有成膜速度快、膜层致密、结合力好、有绕射性、无公害等特点。我国自七十年代后期开始研究,发展迅速,目前该技术已在全国不少省市推广应用。离子镀是在真空条件下,应用气体放电、使气体或被蒸发物质离化、在气体离子或被蒸发物质离子轰击作用的同时把蒸发物或其反应生成物蒸镀在
Ion-plating technology is attracting more and more attention both at home and abroad because of its unique advantages, which has been developing rapidly in recent years. Ion plating to glow discharge, plasma technology and vacuum evaporation technology combined to improve the performance of the coating, coating technology has expanded the scope of application. It combines the advantages of vacuum evaporation and vacuum sputtering, but also has a film forming speed, dense film, good binding, diffraction, pollution-free and so on. Since the beginning of the seventies of last century, our country has started to study and develop rapidly. At present, the technology has been popularized and applied in many provinces and cities across the country. Ion plating is under vacuum conditions, the application of gas discharge, the gas or the evaporation of material ionization, in the gas ions or the ion bombardment of the material being evaporated at the same time evaporate or its reaction product is deposited on