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采用光束均匀器，改善ＸｅＣｌ准分子激光器输出光束强度的分布，其起伏优于２％，用这一装置测量了Ｃ６０薄膜的刻蚀阈值，并完成了准分子激光改变Ｃ６０薄膜电导率的实验研究
The beam homogenizer was used to improve the intensity distribution of the output beam of XeCl excimer laser. The fluctuation was better than 2%. The etching threshold of C60 thin film was measured by this device and the experimental study was conducted to change the conductivity of C60 thin film by excimer laser