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分别给出了能量为350keV的Xe~+注入Cu/Ti双层(RT)和 Cu/Ti多层(LN)薄膜后的表面硬度和电阻的测量结果,研究了混合后的上述性质的时效效果,同时进行了TEM分析。研究结果表明:Cu/Ti离子束混合后的表面硬度和电阻都发生了变化,特别是硬度显著提高。经100—400℃退火后,其表面硬度和电阻的变化主要受退火前的混合程度、热处理引起的相变及损伤恢复程度的综合影响。
The measurement results of the surface hardness and electrical resistance of Xe ~ + implanted Cu / Ti bilayer (RT) and Cu / Ti multilayer (LN) thin films with energy of 350keV are given respectively. The aging effects of the above properties after mixing , While TEM analysis. The results show that the surface hardness and electrical resistance of Cu / Ti ion beam hybrid have changed, especially the hardness increases significantly. After annealing at 100-400 ℃, the changes of surface hardness and resistance are mainly affected by the mixing degree before annealing, the phase transformation caused by heat treatment and the degree of damage recovery.